Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges

Mary Gilliam; Qingsong Yu; Hirotsugu Yasuda

doi:10.1002/ppap.200600076

Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges

Mary Gilliam, Qingsong Yu, Hirotsugu Yasuda

Kettering University

Research output: Contribution to journal › Article › peer-review

Abstract

<div class="line" id="line-59"> The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6 , C 3 F 6 O, C 4 F 10  and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters,  W /FM, revealed the energy&hyphen;deficient and monomer&hyphen;deficient domains for each monomer, along with the critical energy input, ( W /FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer&hyphen;forming species and thus, the monomer&hyphen;deficient domain shifted to a much lower  W /FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer&hyphen;forming species. </div>

Original language	American English
Journal	Plasma Processes Polymers
Volume	4
DOIs	https://doi.org/10.1002/ppap.200600076
State	Published - Feb 26 2007

Keywords

Plasma
Polymerization
Fluorocarbon Monomers

Disciplines

Engineering
Physical Sciences and Mathematics

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10.1002/ppap.200600076License: Unspecified

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@article{4de161f118a249a2b2b9d350081185d4,

title = "Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges",

abstract = " The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6 , C 3 F 6 O, C 4 F 10  and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters,  W /FM, revealed the energy&hyphen;deficient and monomer&hyphen;deficient domains for each monomer, along with the critical energy input, ( W /FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer&hyphen;forming species and thus, the monomer&hyphen;deficient domain shifted to a much lower  W /FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer&hyphen;forming species. ",

keywords = "Plasma, Polymerization, Fluorocarbon Monomers",

author = "Mary Gilliam and Qingsong Yu and Hirotsugu Yasuda",

note = "The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3F 6, C 3F 6O, C 4F 10 and C 2F 4H 2, which were compared to hydrocarbons such as methane and butane.",

year = "2007",

month = feb,

day = "26",

doi = "10.1002/ppap.200600076",

language = "American English",

volume = "4",

journal = "Plasma Processes Polymers",

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TY - JOUR

T1 - Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges

AU - Gilliam, Mary

AU - Yu, Qingsong

AU - Yasuda, Hirotsugu

N1 - The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3F 6, C 3F 6O, C 4F 10 and C 2F 4H 2, which were compared to hydrocarbons such as methane and butane.

PY - 2007/2/26

Y1 - 2007/2/26

N2 - The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6 , C 3 F 6 O, C 4 F 10  and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters,  W /FM, revealed the energy&hyphen;deficient and monomer&hyphen;deficient domains for each monomer, along with the critical energy input, ( W /FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer&hyphen;forming species and thus, the monomer&hyphen;deficient domain shifted to a much lower  W /FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer&hyphen;forming species.

AB - The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6 , C 3 F 6 O, C 4 F 10  and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters,  W /FM, revealed the energy&hyphen;deficient and monomer&hyphen;deficient domains for each monomer, along with the critical energy input, ( W /FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer&hyphen;forming species and thus, the monomer&hyphen;deficient domain shifted to a much lower  W /FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer&hyphen;forming species.

KW - Plasma

KW - Polymerization

KW - Fluorocarbon Monomers

UR - https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.200600076

U2 - 10.1002/ppap.200600076

DO - 10.1002/ppap.200600076

M3 - Article

VL - 4

JO - Plasma Processes Polymers

JF - Plasma Processes Polymers

ER -

Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges

Abstract

Keywords

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