Diamond Growth with Remote Methane Injection in a DC Arcjet CVD Reactor

Scott Reeve; Wayne A Weimer; David S Dandy

Diamond Growth with Remote Methane Injection in a DC Arcjet CVD Reactor

Scott Reeve, Wayne A Weimer, David S Dandy

Kettering University

Research output: Contribution to journal › Article › peer-review

Abstract

 A significant enhancement in the quality of diamond films grown using a remote CH4 carbon
 source was observed in a direct current arcjet chemical vapor deposition reactor. The linewidths
 cd the diamond peak at 1332 cm ’ in the Raman spectra from these films were reduced from
 9.0 to 6.5 cm- ’ with no reduction in mass deposition rate as compared to films grown using
 premixed reactor gas feeds. For diamond growth conditions, the percentage of the reactor feed
 carbon reaching the substrate was measured to be .- 35%. The enhanced quality of the films is
 attributed to reduced residence times of the carbon source in the plasma, which would limit the
 gas phase chemistry from proceeding beyond CH; formation before the gas reaches the
 substrate.

Original language	American English
Journal	Applied Physics Letters
State	Published - Nov 1 1993

Disciplines

Engineering
Materials Science and Engineering
Physical Sciences and Mathematics

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Cite this

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title = "Diamond Growth with Remote Methane Injection in a DC Arcjet CVD Reactor",

abstract = " A significant enhancement in the quality of diamond films grown using a remote CH4 carbon source was observed in a direct current arcjet chemical vapor deposition reactor. The linewidths cd the diamond peak at 1332 cm {\textquoteright} in the Raman spectra from these films were reduced from 9.0 to 6.5 cm- {\textquoteright} with no reduction in mass deposition rate as compared to films grown using premixed reactor gas feeds. For diamond growth conditions, the percentage of the reactor feed carbon reaching the substrate was measured to be .- 35%. The enhanced quality of the films is attributed to reduced residence times of the carbon source in the plasma, which would limit the gas phase chemistry from proceeding beyond CH; formation before the gas reaches the substrate.",

author = "Scott Reeve and Weimer, {Wayne A} and Dandy, {David S}",

year = "1993",

month = nov,

day = "1",

language = "American English",

journal = "Applied Physics Letters",

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TY - JOUR

T1 - Diamond Growth with Remote Methane Injection in a DC Arcjet CVD Reactor

AU - Reeve, Scott

AU - Weimer, Wayne A

AU - Dandy, David S

PY - 1993/11/1

Y1 - 1993/11/1

N2 - A significant enhancement in the quality of diamond films grown using a remote CH4 carbon source was observed in a direct current arcjet chemical vapor deposition reactor. The linewidths cd the diamond peak at 1332 cm ’ in the Raman spectra from these films were reduced from 9.0 to 6.5 cm- ’ with no reduction in mass deposition rate as compared to films grown using premixed reactor gas feeds. For diamond growth conditions, the percentage of the reactor feed carbon reaching the substrate was measured to be .- 35%. The enhanced quality of the films is attributed to reduced residence times of the carbon source in the plasma, which would limit the gas phase chemistry from proceeding beyond CH; formation before the gas reaches the substrate.

AB - A significant enhancement in the quality of diamond films grown using a remote CH4 carbon source was observed in a direct current arcjet chemical vapor deposition reactor. The linewidths cd the diamond peak at 1332 cm ’ in the Raman spectra from these films were reduced from 9.0 to 6.5 cm- ’ with no reduction in mass deposition rate as compared to films grown using premixed reactor gas feeds. For diamond growth conditions, the percentage of the reactor feed carbon reaching the substrate was measured to be .- 35%. The enhanced quality of the films is attributed to reduced residence times of the carbon source in the plasma, which would limit the gas phase chemistry from proceeding beyond CH; formation before the gas reaches the substrate.

M3 - Article

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -