Comparison of Mechanical and Chemomechanical Polished SiC Wafers Using Photon Backscattering

W.C. Mitchel, J. Brown, D. Buckanan, R. Bertke, K. Malalingham, F. Orazio, P. Pirouz, Huang-Ju R. Tseng, Uma Ramabadran, Bahram Roughani

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
JournalMaterials Science Forum
VolumeVolumes 338-342
DOIs
StatePublished - May 10 2000

Keywords

  • 4H-SiC
  • Atomic Force Microscope (AFM)
  • Chemomechanical Polish
  • Micro Raman
  • Photon Backscattering
  • TEM

Disciplines

  • Physics

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