Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films

Mary Gilliam; Susan Farhat; Graham Garner; Barrack Stubbs; Benjamin Peterson

doi:10.1002/ppap.201900024

Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films

Mary Gilliam, Susan Farhat, Graham Garner, Barrack Stubbs, Benjamin Peterson

Kettering University

Research output: Contribution to journal › Article › peer-review

Abstract

<p> The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy&hyphen;deficient and monomer&hyphen;deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier&hyphen;transform infrared spectroscopy (FTIR) and X&hyphen;ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius&hyphen;type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.</p>

Original language	American English
Journal	Plasma Processes Polymers
Volume	16
DOIs	https://doi.org/10.1002/ppap.201900024
State	Published - Apr 12 2019

Keywords

Deposition Characterization
Infrared Spectroscopy
Organosilicon Precursors
Plasma Polymerization
Plasma‐Enhanced Chemical Vapor Deposition

Disciplines

Chemical Engineering
Engineering

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10.1002/ppap.201900024License: CC BY

https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.201900024

Cite this

@article{257fbd25883747aeaad30101d8d9f5e1,

title = "Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films",

abstract = " The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy\&hyphen;deficient and monomer\&hyphen;deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier\&hyphen;transform infrared spectroscopy (FTIR) and X\&hyphen;ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius\&hyphen;type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si\–O\–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.",

keywords = "Deposition Characterization, Infrared Spectroscopy, Organosilicon Precursors, Plasma Polymerization, Plasma‐Enhanced Chemical Vapor Deposition",

author = "Mary Gilliam and Susan Farhat and Graham Garner and Barrack Stubbs and Benjamin Peterson",

year = "2019",

month = apr,

day = "12",

doi = "10.1002/ppap.201900024",

language = "American English",

volume = "16",

journal = "Plasma Processes Polymers",

}

TY - JOUR

T1 - Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films

AU - Gilliam, Mary

AU - Farhat, Susan

AU - Garner, Graham

AU - Stubbs, Barrack

AU - Peterson, Benjamin

PY - 2019/4/12

Y1 - 2019/4/12

N2 - The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy&hyphen;deficient and monomer&hyphen;deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier&hyphen;transform infrared spectroscopy (FTIR) and X&hyphen;ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius&hyphen;type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.

AB - The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy&hyphen;deficient and monomer&hyphen;deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier&hyphen;transform infrared spectroscopy (FTIR) and X&hyphen;ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius&hyphen;type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.

KW - Deposition Characterization

KW - Infrared Spectroscopy

KW - Organosilicon Precursors

KW - Plasma Polymerization

KW - Plasma‐Enhanced Chemical Vapor Deposition

UR - https://digitalcommons.kettering.edu/chem_eng_facultypubs/6

UR - https://onlinelibrary.wiley.com/doi/abs/10.1002/ppap.201900024

U2 - 10.1002/ppap.201900024

DO - 10.1002/ppap.201900024

M3 - Article

VL - 16

JO - Plasma Processes Polymers

JF - Plasma Processes Polymers

ER -

Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films

Abstract

Keywords

Disciplines

Access to Document

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